REACTIVE PULSED - DC MAGNETRON SPUTTERING OF Cr2O3 THIN FILMS.

MLA

Navickas, Edvinas, et al. “REACTIVE PULSED - DC MAGNETRON SPUTTERING OF Cr2O3 THIN FILMS.” International Conference: Radiation Interaction with Material & Its Uses in Technologies, Sept. 2008, pp. 155–58. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edo&AN=35615139&authtype=sso&custid=ns315887.

APA

Navickas, E., Milčius, D., & Laukaitis, G. (2008). REACTIVE PULSED - DC MAGNETRON SPUTTERING OF Cr2O3 THIN FILMS. International Conference: Radiation Interaction with Material & Its Uses in Technologies, 155–158.

Chicago

Navickas, Edvinas, Darius Milčius, and Giedrius Laukaitis. 2008. “REACTIVE PULSED - DC MAGNETRON SPUTTERING OF Cr2O3 THIN FILMS.” International Conference: Radiation Interaction with Material & Its Uses in Technologies, September, 155–58. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edo&AN=35615139&authtype=sso&custid=ns315887.