Automated AFM as an Industrial Process Metrology Tool for Nanoelectronic Manufacturing.

Scanning probe microscope (SPM) techniques, invented 20 years ago, act as eyes for nanotechnology and nanoscience research and development, for imaging and characterizing surface topography and properties at atomic resolution. Particularly for the past decade, atomic force microscopy (AFM, one member of the SPM family) has evolved from laboratory research instrumentation to an industry metrology tool for geometric dimension control in nanoelectronic device manufacturing on production floors. This chapter gives an overview in great technical detail of state-of-the-art AFM applications in process characterization and inline monitoring for semiconductor manufacturing. Use of AFM equally applies for topography, dimension, and sidewall shape metrology in photomask and hard disk recording head processing. [ABSTRACT FROM AUTHOR]