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MuGFET CMOS Process with Midgap Gate Material.

Authors :
Hall, Steve
Nazarov, Alexei N.
Lysenko, Vladimir S.
Xiong, W.
Cleavelin, C. R.
Schulz, T.
Schrüfer, K.
Patruno, P.
Colinge, Jean-Pierre
Source :
Nanoscaled Semiconductor-on-Insulator Structures & Devices; 2007, p159-164, 6p
Publication Year :
2007

Abstract

An increase in threshold voltage is observed in ultra-thin body MuGFET (multi-gate FET) devices. The threshold increase is due to of lack of carriers at the classical threshold definition. A sufficient amount of carrier build-up requires additional gate voltage (0.12V in our experiment). [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISBNs :
9781402063787
Database :
Supplemental Index
Journal :
Nanoscaled Semiconductor-on-Insulator Structures & Devices
Publication Type :
Book
Accession number :
33171134
Full Text :
https://doi.org/10.1007/978-1-4020-6380-0_11