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Enhanced Oxidation Resistance and Interface Stability of Atomic-Layer-Deposited MoNx Electrodes via TiN Passivation for DRAM Cell Capacitor Applications.

Authors :
Kang, Wangu
Ahn, Ji Sang
Lee, Jae Hyeon
Choi, Byung Joon
Han, Jeong Hwan
Source :
ACS Applied Materials & Interfaces; 10/23/2024, Vol. 16 Issue 42, p57446-57456, 11p
Publication Year :
2024

Details

Language :
English
ISSN :
19448244
Volume :
16
Issue :
42
Database :
Supplemental Index
Journal :
ACS Applied Materials & Interfaces
Publication Type :
Academic Journal
Accession number :
180454995
Full Text :
https://doi.org/10.1021/acsami.4c14077