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Selective-Area Growth of Hexagonal-to-Cubic GaN as an n‑Type Metal–Oxide–Semiconductor Field-Effect Transistor Drain on a Nanogrooved Si(100) Substrate.

Details

Language :
English
ISSN :
15287483
Volume :
24
Issue :
20
Database :
Supplemental Index
Journal :
Crystal Growth & Design
Publication Type :
Academic Journal
Accession number :
180327923
Full Text :
https://doi.org/10.1021/acs.cgd.4c00683