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Atomistic Simulation of HF Etching Process of Amorphous Si3N4 Using Machine Learning Potential.
- Source :
- ACS Applied Materials & Interfaces; 9/11/2024, Vol. 16 Issue 36, p48457-48469, 13p
- Publication Year :
- 2024
Details
- Language :
- English
- ISSN :
- 19448244
- Volume :
- 16
- Issue :
- 36
- Database :
- Supplemental Index
- Journal :
- ACS Applied Materials & Interfaces
- Publication Type :
- Academic Journal
- Accession number :
- 179606352
- Full Text :
- https://doi.org/10.1021/acsami.4c07949