Low-Temperature Dechlorosilylation Chemistry for Area-Selective Deposition of Ge2Sb2Te5 and Its Mechanism in Nanopatterns.

MLA

Sinha, Jyoti, et al. “Low-Temperature Dechlorosilylation Chemistry for Area-Selective Deposition of Ge2Sb2Te5 and Its Mechanism in Nanopatterns.” Chemistry of Materials, vol. 36, no. 12, June 2024, pp. 5943–52. EBSCOhost, https://doi.org/10.1021/acs.chemmater.4c00286.

APA

Sinha, J., Gallis, L., Clerix, J.-W. J., van der Veen, M., Innocent, J., Illiberi, A., Givens, M., Nyns, L., & Delabie, A. (2024). Low-Temperature Dechlorosilylation Chemistry for Area-Selective Deposition of Ge2Sb2Te5 and Its Mechanism in Nanopatterns. Chemistry of Materials, 36(12), 5943–5952. https://doi.org/10.1021/acs.chemmater.4c00286

Chicago

Sinha, Jyoti, Leonidas Gallis, Jan-Willem J. Clerix, Marleen van der Veen, Jerome Innocent, Andrea Illiberi, Michael Givens, Laura Nyns, and Annelies Delabie. 2024. “Low-Temperature Dechlorosilylation Chemistry for Area-Selective Deposition of Ge2Sb2Te5 and Its Mechanism in Nanopatterns.” Chemistry of Materials 36 (12): 5943–52. doi:10.1021/acs.chemmater.4c00286.