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Effect of Annealing Temperature on Minimum Domain Size of Ferroelectric Hafnia.

Authors :
Yun, Seokjung
Kim, Hoon
Seo, Myungsoo
Kang, Min-Ho
Kim, Taeho
Cho, Seongwoo
Park, Min Hyuk
Jeon, Sanghun
Choi, Yang-Kyu
Hong, Seungbum
Source :
ACS Applied Electronic Materials; 4/23/2024, Vol. 6 Issue 4, p2134-2141, 8p
Publication Year :
2024

Details

Language :
English
ISSN :
26376113
Volume :
6
Issue :
4
Database :
Supplemental Index
Journal :
ACS Applied Electronic Materials
Publication Type :
Academic Journal
Accession number :
176805657
Full Text :
https://doi.org/10.1021/acsaelm.3c01104