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High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance.
- Source :
- Chemistry of Materials; 4/9/2024, Vol. 36 Issue 7, p3326-3333, 8p
- Publication Year :
- 2024
Details
- Language :
- English
- ISSN :
- 08974756
- Volume :
- 36
- Issue :
- 7
- Database :
- Supplemental Index
- Journal :
- Chemistry of Materials
- Publication Type :
- Academic Journal
- Accession number :
- 176561020
- Full Text :
- https://doi.org/10.1021/acs.chemmater.3c03324