Back to Search
Start Over
Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys.
- Source :
- Crystal Growth & Design; 10/4/2023, Vol. 23 Issue 10, p7010-7025, 16p
- Publication Year :
- 2023
Details
- Language :
- English
- ISSN :
- 15287483
- Volume :
- 23
- Issue :
- 10
- Database :
- Supplemental Index
- Journal :
- Crystal Growth & Design
- Publication Type :
- Academic Journal
- Accession number :
- 172824261
- Full Text :
- https://doi.org/10.1021/acs.cgd.3c00775