Mesh Bias Controlled Synthesis of TiO2 and Al0.74Ti0.26O3 Thin Films by Mist Chemical Vapor Deposition and Applications as Gate Dielectric Layers for Field-Effect Transistors.

Details

Language :

English

ISSN :

26376113

Volume :

4

Issue :

5

Database :

Supplemental Index

Journal :

ACS Applied Electronic Materials

Publication Type :

Academic Journal

Accession number :

157097640

Full Text :

https://doi.org/10.1021/acsaelm.2c00286