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Some Insights into Atomic Layer Deposition of MoNx Using Mo(CO)6 and NH3 and Its Diffusion Barrier Application.

Authors :
Kim, Tae Hyun
Nandi, Dip K.
Ramesh, Rahul
Han, Seung-Min
Shong, Bonggeun
Kim, Soo-Hyun
Source :
Chemistry of Materials; Oct2019, Vol. 31 Issue 20, p8338-8350, 13p
Publication Year :
2019

Details

Language :
English
ISSN :
08974756
Volume :
31
Issue :
20
Database :
Supplemental Index
Journal :
Chemistry of Materials
Publication Type :
Academic Journal
Accession number :
144957222
Full Text :
https://doi.org/10.1021/acs.chemmater.9b01578