Use of a Thermally Degradable Chemical Vapor Deposited Polymer Film for Low Damage Plasma Processing of Highly Porous Dielectrics.

Details

Language :

English

ISSN :

26376113

Volume :

1

Issue :

12

Database :

Supplemental Index

Journal :

ACS Applied Electronic Materials

Publication Type :

Academic Journal

Accession number :

144954886

Full Text :

https://doi.org/10.1021/acsaelm.9b00589