Stress-Induced Crystallization of Thin Hf1–XZrXO2 Films: The Origin of Enhanced Energy Density with Minimized Energy Loss for Lead-Free Electrostatic Energy Storage Applications.

Details

Language :

English

ISSN :

19448244

Volume :

11

Issue :

5

Database :

Supplemental Index

Journal :

ACS Applied Materials & Interfaces

Publication Type :

Academic Journal

Accession number :

144849691

Full Text :

https://doi.org/10.1021/acsami.8b17211