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Efficient Passivation and Low Resistivity for p+-Si/TiO2 Contact by Atomic Layer Deposition.
- Source :
- ACS Applied Energy Materials; 7/27/2020, Vol. 3 Issue 7, p6291-6301, 11p
- Publication Year :
- 2020
Details
- Language :
- English
- ISSN :
- 25740962
- Volume :
- 3
- Issue :
- 7
- Database :
- Supplemental Index
- Journal :
- ACS Applied Energy Materials
- Publication Type :
- Academic Journal
- Accession number :
- 144818021
- Full Text :
- https://doi.org/10.1021/acsaem.0c00378