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Fabrication of Sub-3 nm Feature Size Based on Block Copolymer Self-Assembly for Next-Generation Nanolithography.

Authors :
Jongheon Kwak
Mishra, Avnish Kumar
Jaeyong Lee
Kyu Seong Lee
Chungryong Choi
Maiti, Sandip
Mooseong Kim
Jin Kon Kim
Source :
Macromolecules; Sep2017, Vol. 50 Issue 17, p6813-6818, 6p
Publication Year :
2017

Details

Language :
English
ISSN :
00249297
Volume :
50
Issue :
17
Database :
Supplemental Index
Journal :
Macromolecules
Publication Type :
Academic Journal
Accession number :
126047038
Full Text :
https://doi.org/10.1021/acs.macromol.7b00945