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Lateral Ge Diffusion During Oxidation of Si/SiGe Fins.
- Source :
- Nano Letters; Apr2017, Vol. 17 Issue 4, p2159-2164, 6p
- Publication Year :
- 2017
Details
- Language :
- English
- ISSN :
- 15306984
- Volume :
- 17
- Issue :
- 4
- Database :
- Supplemental Index
- Journal :
- Nano Letters
- Publication Type :
- Academic Journal
- Accession number :
- 122550917
- Full Text :
- https://doi.org/10.1021/acs.nanolett.6b04407