Cite
Evanescent Light Exposing System under Nitrogen Purge for Nano-Stereolithography.
MLA
Suzuki, Yuki, et al. “Evanescent Light Exposing System under Nitrogen Purge for Nano-Stereolithography.” Procedia CIRP, vol. 42, Apr. 2016, pp. 77–80. EBSCOhost, https://doi.org/10.1016/j.procir.2016.02.192.
APA
Suzuki, Y., Tahara, H., Michihata, M., Takamasu, K., & Takahashi, S. (2016). Evanescent Light Exposing System under Nitrogen Purge for Nano-Stereolithography. Procedia CIRP, 42, 77–80. https://doi.org/10.1016/j.procir.2016.02.192
Chicago
Suzuki, Yuki, Hiroyuki Tahara, Masaki Michihata, Kiyoshi Takamasu, and Satoru Takahashi. 2016. “Evanescent Light Exposing System under Nitrogen Purge for Nano-Stereolithography.” Procedia CIRP 42 (April): 77–80. doi:10.1016/j.procir.2016.02.192.