Fabrication of metallic hole array metamaterials with 760 nm and 1930 nm lattice constant by interfering femtosecond laser processing.

Infrared and ultraviolet femtosecond lasers were used for interfering laser processing of thin gold film on silica glass substrate for the fabrication of MHA (metallic hole array) metamaterial devices. Through single shot processing and step scanning, devices with an area of 10 × 10 mm were successfully fabricated. The lattice constant of the device processed at infrared wavelength was 1930 nm, and it was shortened to 760 nm by means of ultraviolet wavelength. The transmission spectrum was observed, and the anomalous transmission peak wavelength was approximately 59% shorter in the case of a 760 nm lattice constant compared with a 1930 nm lattice constant. [ABSTRACT FROM AUTHOR]