Electrical Line Monitoring in a 300 mm Copper Fab.

MLA

Soucek, Matt, et al. “Electrical Line Monitoring in a 300 Mm Copper Fab.” Semiconductor International, vol. 26, no. 8, July 2003, p. 80. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edo&AN=10209398&authtype=sso&custid=ns315887.

APA

Soucek, M., Anderson, J., Chahal, H., Price, D. W., Boahen, K., & Breaux, L. (2003). Electrical Line Monitoring in a 300 mm Copper Fab. Semiconductor International, 26(8), 80.

Chicago

Soucek, Matt, Justin Anderson, Harry Chahal, David W. Price, Kwame Boahen, and Louis Breaux. 2003. “Electrical Line Monitoring in a 300 Mm Copper Fab.” Semiconductor International 26 (8): 80. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edo&AN=10209398&authtype=sso&custid=ns315887.