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Negative transconductance in a resistive gate metal-semiconductor field-effect transistor.
- Source :
- Applied Physics Letters; 5/8/1989, Vol. 54 Issue 19, p1884, 3p
- Publication Year :
- 1989
-
Abstract
- Negative transconductance is reported in a resistive gate metal-semiconductor field-effect transistor (MESFET) for the first time. The negative transconductance arises as a result of the negative differential mobility of electrons in the GaAs channel, and is adequately described by a simple equivalent circuit model. The experimental device is fabricated with a planar ion-implanted MESFET process, and shows promise as a microwave signal source for use in monolithic microwave integrated circuits. [ABSTRACT FROM AUTHOR]
- Subjects :
- METAL semiconductor field-effect transistors
ELECTRON mobility
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 54
- Issue :
- 19
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 9831160
- Full Text :
- https://doi.org/10.1063/1.101230