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Negative transconductance in a resistive gate metal-semiconductor field-effect transistor.

Authors :
Yin, Y.
Cooper, J. A.
Neudeck, P. G.
Balzan, M. L.
Geissberger, A. E.
Source :
Applied Physics Letters; 5/8/1989, Vol. 54 Issue 19, p1884, 3p
Publication Year :
1989

Abstract

Negative transconductance is reported in a resistive gate metal-semiconductor field-effect transistor (MESFET) for the first time. The negative transconductance arises as a result of the negative differential mobility of electrons in the GaAs channel, and is adequately described by a simple equivalent circuit model. The experimental device is fabricated with a planar ion-implanted MESFET process, and shows promise as a microwave signal source for use in monolithic microwave integrated circuits. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
54
Issue :
19
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
9831160
Full Text :
https://doi.org/10.1063/1.101230