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A novel induction heater for chemical vapor deposition.

Authors :
Ong, C. W.
Wong, H. K.
Sin, K. S.
Yip, S. T.
Chik, K. P.
Source :
Review of Scientific Instruments; Jun89, Vol. 60 Issue 6, p1174, 3p
Publication Year :
1989

Abstract

We report how an induction cooker for household use can be modified for heating substrate or heating gases to high temperature in a chemical vapor deposition system. Only minor changes of the cooker are necessary. Stable substrate temperature as high as 900 °C was achieved with input power of about 1150 W. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00346748
Volume :
60
Issue :
6
Database :
Complementary Index
Journal :
Review of Scientific Instruments
Publication Type :
Academic Journal
Accession number :
9784596
Full Text :
https://doi.org/10.1063/1.1140281