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Electrical stability of multilayer MoS2 field-effect transistor under negative bias stress at various temperatures.

Authors :
Yang, Suk
Park, Solah
Jang, Sukjin
Kim, Hojoong
Kwon, Jang ‐ Yeon
Source :
Physica Status Solidi - Rapid Research Letters; Aug2014, Vol. 8 Issue 8, p714-718, 5p
Publication Year :
2014

Abstract

The electrical stability of molybdenum disulfide (MoS<subscript>2</subscript>) transistors is crucial for their use in various applications. However, it is tricky to evaluate the inherent stability of MoS<subscript>2</subscript> transistors because it is highly dependent on environmental conditions during measurement such as humidity, light, and electrical factors. We studied the threshold voltage instability under negative bias stress at a variety of temperatures in a vacuum and in the dark to eliminate any environmental effects. In particular, the measurement of transfer curves under stress is minimized in order to study the inherent instability of MoS<subscript>2</subscript> transistors, even though the measurement of transfer curves is normally indispensable to check for the evolution of electrical instability. MoS<subscript>2</subscript> transistors have high average effective energy when compared to conventional amorphous Si and oxide semiconductor transistors, which allows for adequate operation at high temperatures. (© 2014 WILEY-VCH Verlag GmbH &Co. KGaA, Weinheim) [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
18626254
Volume :
8
Issue :
8
Database :
Complementary Index
Journal :
Physica Status Solidi - Rapid Research Letters
Publication Type :
Academic Journal
Accession number :
97447809
Full Text :
https://doi.org/10.1002/pssr.201409146