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Thermal budget impact on HKMG Al2O3 and La gate stacks for advanced DRAM periphery transistors.

Authors :
Ritzenthaler, R.
Schram, T.
Spessot, A.
Caillat, C.
Na, H.-J.
Lee, S.-G.
Son, Y.
Noh, K. B.
Aoulaiche, M.
Arimura, H.
Horiguchi, N.
Fazan, P.
Thean, A.
Source :
2014 IEEE Workshop On Microelectronics & Electron Devices (WMED); 2014, p1-4, 4p
Publication Year :
2014

Details

Language :
English
ISBNs :
9781479922208
Database :
Complementary Index
Journal :
2014 IEEE Workshop On Microelectronics & Electron Devices (WMED)
Publication Type :
Conference
Accession number :
97035076
Full Text :
https://doi.org/10.1109/WMED.2014.6818721