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Effect of Device Variants in 32 nm and 45 nm SOI on SET Pulse Distributions.

Authors :
Maharrey, J. A.
Quinn, R. C.
Loveless, T. D.
Kauppila, J. S.
Jagannathan, S.
Atkinson, N. M.
Gaspard, N. J.
Zhang, E. X.
Alles, M. L.
Bhuva, B. L.
Holman, W. T.
Massengill, L. W.
Source :
IEEE Transactions on Nuclear Science; Dec2013 Part 1, Vol. 60 Issue 6, p4399-4404, 6p
Publication Year :
2013

Abstract

Single-Event Transient (SET) pulse widths were obtained from the heavy-ion irradiation of inverters designed in 32 nm and 45 nm silicon-on-insulator (SOI). The effects of threshold voltage and body contact are shown to significantly impact the SET response of advanced SOI technologies. Also, the reverse cumulative distribution is extracted from the count distribution for several targets and is shown to be a useful aid in selecting the temporal filtering for radiation-hardened circuitry. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
00189499
Volume :
60
Issue :
6
Database :
Complementary Index
Journal :
IEEE Transactions on Nuclear Science
Publication Type :
Academic Journal
Accession number :
93280930
Full Text :
https://doi.org/10.1109/TNS.2013.2288572