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A 7-mask CMOS process with selective oxide deposition.
- Source :
- IEEE Transactions on Electron Devices; 1993, Vol. 40 Issue 8, p1455-1460, 6p
- Publication Year :
- 1993
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 40
- Issue :
- 8
- Database :
- Complementary Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- 93119042
- Full Text :
- https://doi.org/10.1109/16.223705