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A 7-mask CMOS process with selective oxide deposition.

Authors :
Horiuchi, T.
Kanba, K.
Homma, T.
Murao, Y.
Okumura, K.
Source :
IEEE Transactions on Electron Devices; 1993, Vol. 40 Issue 8, p1455-1460, 6p
Publication Year :
1993

Details

Language :
English
ISSN :
00189383
Volume :
40
Issue :
8
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
93119042
Full Text :
https://doi.org/10.1109/16.223705