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Development of highly reliable Al-Si-Pd alloy interconnections for VLSI.

Authors :
Koubuchi, Y.
Onuki, J.
Fukada, S.
Suwa, M.
Source :
IEEE Transactions on Electron Devices; 1990, Vol. 37 Issue 4, p947-951, 5p
Publication Year :
1990

Details

Language :
English
ISSN :
00189383
Volume :
37
Issue :
4
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
93117608
Full Text :
https://doi.org/10.1109/16.52428