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Electron and hole mobilities in silicon as a function of concentration and temperature.

Authors :
Arora, N.D.
Hauser, J.R.
Roulston, D.J.
Source :
IEEE Transactions on Electron Devices; 1982, Vol. 29 Issue 2, p292-295, 4p
Publication Year :
1982

Details

Language :
English
ISSN :
00189383
Volume :
29
Issue :
2
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
93113867
Full Text :
https://doi.org/10.1109/T-ED.1982.20698