Soft-breakdown damage in MOSFET's due to high-density plasma etching exposure.

Details

Language :

English

ISSN :

07413106

Volume :

17

Issue :

8

Database :

Complementary Index

Journal :

IEEE Electron Device Letters

Publication Type :

Academic Journal

Accession number :

92796477

Full Text :

https://doi.org/10.1109/55.511584