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Deep UV exposure of Ag2Se/GeSe2utilizing an excimer laser.

Authors :
Polasko, K.J.
Ehrlich, D.J.
Tsao, J.Y.
Pease, R.F.W.
Marinero, E.E.
Source :
IEEE Electron Device Letters; 1984, Vol. 5 Issue 1, p24-26, 3p
Publication Year :
1984

Details

Language :
English
ISSN :
07413106
Volume :
5
Issue :
1
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
92793616
Full Text :
https://doi.org/10.1109/EDL.1984.25818