The impact of nitrogen profile engineering on ultrathin nitrided oxide films for dual-gate CMOS ULSI.

Details

Language :

English

ISBNs :

9780780327009

Database :

Complementary Index

Journal :

Proceedings of International Electron Devices Meeting

Publication Type :

Conference

Accession number :

92448837

Full Text :

https://doi.org/10.1109/IEDM.1995.499207