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200 mm DUV Lithography : Material and Process Optimization Application to 0.25 μm CMOS Technology.

Authors :
Vinet, F.
Buffet, N.
Le Cornec, Ch.
Lerme, M.
Morand, Y.
Mourier, T.
Previtali, B
Paniez, P. J.
Source :
ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference; 1995, p123-126, 4p
Publication Year :
1995

Details

Language :
English
ISBNs :
9782863321829
Database :
Complementary Index
Journal :
ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference
Publication Type :
Conference
Accession number :
92389810

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