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An Advanced Bipolar Process using Trench Isolation and Polysilicon Emitter for High Speed VLSI.
- Source :
- ESSDERC '87: 17th European Solid State Device Research Conference; 1987, p507-510, 4p
- Publication Year :
- 1987
Details
- Language :
- English
- ISBNs :
- 9780444704771
- Database :
- Complementary Index
- Journal :
- ESSDERC '87: 17th European Solid State Device Research Conference
- Publication Type :
- Conference
- Accession number :
- 92388339