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Impact of low pressure long throw sputtering method on submicron copper metallization.

Authors :
Saito, T.
Ohashi, N.
Yasuda, J.
Noguchi, J.
Imai, T.
Sasajima, K.
Hiruma, K.
Yamaguchi, H.
Owada, N.
Source :
Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat No98EX102); 1998, p160-162, 3p
Publication Year :
1998

Details

Language :
English
ISBNs :
9780780342859
Database :
Complementary Index
Journal :
Proceedings of the IEEE 1998 International Interconnect Technology Conference (Cat No98EX102)
Publication Type :
Conference
Accession number :
92320348
Full Text :
https://doi.org/10.1109/IITC.1998.704779