A new type of local defects in very thin silicon dioxide films on arsenic-implanted p-type silicon.

Details

Language :

English

ISBNs :

9780780327979

Database :

Complementary Index

Journal :

Proceedings of 5th International Symposium on the Physical & Failure Analysis of Integrated Circuits

Publication Type :

Conference

Accession number :

92288832

Full Text :

https://doi.org/10.1109/IPFA.1995.487611