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High current implanter dopant cross-contamination and its control.

Authors :
Jiejie Xu
Lee, H.S.
Source :
Proceedings of 11th International Conference on Ion Implantation Technology; 1996, p151-154, 4p
Publication Year :
1996

Details

Language :
English
ISBNs :
9780780332898
Database :
Complementary Index
Journal :
Proceedings of 11th International Conference on Ion Implantation Technology
Publication Type :
Conference
Accession number :
92254947
Full Text :
https://doi.org/10.1109/IIT.1996.586161