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CVD tungsten and tungsten silicide for multilevel metallization.

Authors :
Wu, S.
Price, J.B.
Rosler, R.S.
Mendoca, J.
Beers, A.
Source :
International Symposium on VLSI Technology, Systems & Applications; 1989, p63-67, 5p
Publication Year :
1989

Details

Language :
English
Database :
Complementary Index
Journal :
International Symposium on VLSI Technology, Systems & Applications
Publication Type :
Conference
Accession number :
92190697
Full Text :
https://doi.org/10.1109/VTSA.1989.68583