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High rate deposition of silicon films for solar cells by plasma-enhanced CVD from trichlorosilane.
- Source :
- Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997; 1997, p743-746, 4p
- Publication Year :
- 1997
Details
- Language :
- English
- ISBNs :
- 9780780337671
- Database :
- Complementary Index
- Journal :
- Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997
- Publication Type :
- Conference
- Accession number :
- 92176190
- Full Text :
- https://doi.org/10.1109/PVSC.1997.654196