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A new low-voltage contrast mechanism to image local defects in very thin silicon dioxide films: true oxide electron beam induced current.

Authors :
Lau, W.S.
Chan, D.S.H.
Phang, J.C.H.
Chow, K.W.
Pey, K.S.
Lim, Y.P.
Cronquist, B.
Source :
31st Annual Proceedings Reliability Physics 1993; 1993, p190-198, 9p
Publication Year :
1993

Details

Language :
English
ISBNs :
9780780307827
Database :
Complementary Index
Journal :
31st Annual Proceedings Reliability Physics 1993
Publication Type :
Conference
Accession number :
92147615
Full Text :
https://doi.org/10.1109/RELPHY.1993.283325