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New applications of focused ion beam technique to failure analysis and process monitoring of VLSI.
- Source :
- 27th Annual Proceedings, International Reliability Physics Symposium; 1989, p43-52, 10p
- Publication Year :
- 1989
Details
- Language :
- English
- Database :
- Complementary Index
- Journal :
- 27th Annual Proceedings, International Reliability Physics Symposium
- Publication Type :
- Conference
- Accession number :
- 92144739
- Full Text :
- https://doi.org/10.1109/RELPHY.1989.36316