Plasma-induced charging damage in ultrathin (3 nm) nitrided oxides.

Authors :: Chen, C.-C.
Lin, H.-C.
Chang, C.-Y.
Liang, M.-S.
Chien, C.-H.
Hsien, S.-K.
Huang, T.-Y.
Source :: 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat No99TH8395); 1999, p141-144, 4p
Publication Year :: 1999

Language :: English
ISBNs :: 9780965157735
Database :: Complementary Index
Journal :: 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat No99TH8395)
Publication Type :: Conference
Accession number :: 92131338
Full Text :: https://doi.org/10.1109/PPID.1999.798834