Reduction and non-uniformity of high density plasma process induced electrical degradation in MOS devices.

Details

Language :

English

ISBNs :

9780965157735

Database :

Complementary Index

Journal :

1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat No99TH8395)

Publication Type :

Conference

Accession number :

92131327

Full Text :

https://doi.org/10.1109/PPID.1999.798823