Utilizing substrate damage introduced by MERIE of single crystal silicon for selective CVD of oxide.

Details

Language :

English

ISBNs :

9780965157728

Database :

Complementary Index

Journal :

1998 3rd International Symposium on Plasma Process-Induced Damage (Cat No98EX100)

Publication Type :

Conference

Accession number :

92123226

Full Text :

https://doi.org/10.1109/PPID.1998.725582