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An integrated low resistance aluminum plug and low-k polymer dielectric for high performance 0.25 /spl mu/m interconnects.

Authors :
Dixit, G.A.
Taylor, K.J.
Singh, A.
Lee, C.K.
Shinn, G.B.
Konecni, A.
Hsu, W.Y.
Brennan, K.
Mi-Chang Chang
Havemann, R.H.
Source :
1996 Symposium on VLSI Technology Digest of Technical Papers; 1996, p86-87, 2p
Publication Year :
1996

Details

Language :
English
ISBNs :
9780780333420
Database :
Complementary Index
Journal :
1996 Symposium on VLSI Technology Digest of Technical Papers
Publication Type :
Conference
Accession number :
92113759
Full Text :
https://doi.org/10.1109/VLSIT.1996.507803