A trench isolation study for deep submicron CMOS technology.

Authors :: Chen, I.C.
Rodder, M.
Chatterjee, A.
Teng, C.W.
Source :: 1993 International Symposium on VLSI Technology, Systems & Applications Proceedings of Technical Papers; 1993, p251-255, 5p
Publication Year :: 1993

Language :: English
ISBNs :: 9780780309784
Database :: Complementary Index
Journal :: 1993 International Symposium on VLSI Technology, Systems & Applications Proceedings of Technical Papers
Publication Type :: Conference
Accession number :: 92097844
Full Text :: https://doi.org/10.1109/VTSA.1993.263595