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Stress Topology within Silicon Single-Crystal Cantilever Beam.

Authors :
Kuzmenko, A. P.
Timakov, D. I.
Abakumov, P. V.
Dobromyslov, M. B.
Odnodvorets, L. V.
Source :
Journal of Nano- & Electronic Physics; 2013, Vol. 5 Issue 3, p03024-1-03024-5, 5p
Publication Year :
2013

Abstract

Flexural elastic deformations of single-crystal silicon with microspectral Raman scattering are studied. The investigation results are given on nano-scaled sign-changing shifts of the main peak of the microspectral Raman scattering within the single-crystal silicon cantilever beam under influence of flexural stress. The maximum value of Raman shift characteristic of silicon peak equal to 518 cm<superscript>-1</superscript>, when elasticity still remains, amounted to 8 cm<superscript>-1</superscript>. The qualitative explanation of increase in strength of the cantilever beam due to its small thickness (2 μm) is provided, which is in accord with predictions of real-world physical parameters that were obtained in software environment SolidWorks with the module SimulationXpress. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
20776772
Volume :
5
Issue :
3
Database :
Complementary Index
Journal :
Journal of Nano- & Electronic Physics
Publication Type :
Academic Journal
Accession number :
91590459