Photo-pseudo-metal-oxide-semiconductor field effect transistor for characterization of surface recombination in silicon on insulator materials.

One of the main issues in the characterization of silicon on insulator (SOI) substrates is to determine the quality of the film-buried oxide interface. This interface quality is strongly connected to the carrier lifetime in the silicon film. In this paper, we extend the well-known pseudo-MOSFET characterization technique for SOI wafers to the extraction of carrier lifetime. The experiment consists in comparing the drain current measured under dark and under laser shining. A model is proposed to evaluate the surface recombination velocity in SOI. Experimental results are validated by numerical simulations. [ABSTRACT FROM AUTHOR]