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STRAIN MEASUREMENT IN EPITAXIAL NiSi2/Si(lll) BY MeV ION CHANNELING.
- Source :
- MRS Online Proceedings Library; 01/12/1985, Vol. 56, pN.PAG-1, 1p
- Publication Year :
- 1985
Details
- Language :
- English
- ISSN :
- 19464274
- Volume :
- 56
- Database :
- Complementary Index
- Journal :
- MRS Online Proceedings Library
- Publication Type :
- Conference
- Accession number :
- 86833051
- Full Text :
- https://doi.org/10.1557/PROC-56-157