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Electrical Characterization of Ion Imiplanted, Thermally Annealed TiN Films Acting as Diffusion Barriers on Shallow Junction Silicon Devices.
- Source :
- MRS Online Proceedings Library; 01/01/1985, Vol. 45, pN.PAG-1, 1p
- Publication Year :
- 1985
Details
- Language :
- English
- ISSN :
- 19464274
- Volume :
- 45
- Database :
- Complementary Index
- Journal :
- MRS Online Proceedings Library
- Publication Type :
- Conference
- Accession number :
- 86832366
- Full Text :
- https://doi.org/10.1557/PROC-45-183