Quick deposition of various thin films by intense pulsed ion beam.

A high-density, high-temperature, ablation plasma has been efficiently produced by the irradiation of an intense pulsed ion beam onto solid targets. Properties of such the target plasma has been diagnosed by using time-resolved spectroscopy and high speed photography. Electron temperature and density of the plasma was estimated to be ∼ 0.8 eV and ∼ 1018 cm−3, respectively. By using such the ablation plasma, we have succeeded to prepare very quickly various kinds of thin films such as electroluminescent layer of ZnS, superconductive film of Y1Ba2Cu3O7−x, and high dielectric constant material of BaTiO3. [ABSTRACT FROM PUBLISHER]